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link ns2121 This report evaluates the pulsed breakdown performance of C4F7N under a 6.8 kV/ns voltage excitation. The pulsed dielectric strength of C4F7N is compared to SF6 in the same experimental setup, and it is found that C4F7N concentrations of 50% or greater are required to achieve a dielectric strength greater than or equal to SF6. Pure C4F7N demonstrated higher electric field hold-off for longer

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